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Materials Research Laboratory
Materials Science and Engineering: Thin-film Electronics
- Superhard Coating
- In Situ Studies of GaN Growth
- Growth and Physical Properties of Epitaxial Transition–Metal Nitrides and Nitride Superlattices
^ Superhard Coating
H. Chen,* C. H. Ma, J. H. Huang (Tsing Hua Univ., Taiwan)
U.S. Department of Energy, DE-FG02-91ER45439; NSC Grant, Taiwan
(In cooperation with the Frederick Seitz Materials Research Laboratory)
For improved hardness, corrosion resistance, and decorative purposes, titanium nitride has received a wide range of applications. Fundamental problems involving adhesion, interface strength, effect of residual stress on strength, texture effect on properties, and so forth are some of the significant topics that still require systematic investigation. Moreover, refining coating procedures to improve the aforementioned properties by introducing new microstructure remains a great challenge. This program involves the deposition and characterization of transition metal nitride thin films as well as boron nitrides obtained by ion beam assisted deposition (IBAD) and laser ablation deposition (LAD) methods. A variety of microstructure/microchemistry techniques along with mechanical and corrosion testing are carried out.
^ In Situ Studies of GaN Growth
J. M. Gibson,* M. Yeadon
U.S. Office of Naval Research, N00014-95-1-0324
(In cooperation with the Frederick Seitz Materials Research Laboratory)
Researchers use in situ transmission electron microscopy to understand the growth of Ga and Al nitrides on sapphire substrates. The growth method is reactive molecular beam epitaxy.
^ Growth and Physical Properties of Epitaxial Transition–Metal Nitrides and Nitride Superlattices
J. E. Greene,* F. Adibi, I. Petrov
U.S. Department of Energy, DE-FG02-91ER45439
(In cooperation with the Frederick Seitz Materials Research Laboratory)
Transition-metal nitrides such as TiN are used extensively as hard and wear-protective coatings for mechanical components, as abrasion-resistant optical coatings, and as diffusion barriers in integrated circuits. Researchers have grown the first single-crystal TiN layers, using ultrahigh vacuum reactive magnetron sputter deposition on MgO, and have investigated their mechanical, electrical, and optical properties. Researchers have also grown the first epitaxial nitride strained-layer superlattices, TiN/VN, and have found that they have mechanical and electrical properties that are a strong function of the superlattice period. Recently, researchers have grown metastable NaCl-structure (Ti, Al)N alloys and have found that they have greatly enhanced high-temperature oxidation resistance.
